Facilities

Deposition techniques

Advanced PVD magnetron sputtering systems (Cube)

PVD magnetron sputtering systems

PVD magnetron sputtering system (TiO2)

Experimental PVD superlattice/multilayer sputtering system

PVD chamber with Cluster Source

High Target Utilisation Sputtering system (HiTUS)

Pulsed laser deposition (PLD)

Thermal evaporation system

Annealing furnace up to 1600°C in Ar, N2, O2

Annealing furnace up to 1300°C in high vacuum

Analysis and measurements

Rapid thermal annealing up to 1200°C

Optical litography + 3D laser confocal microscope

Ion etching chambers (Sputnik)

Ellipsometry

FIB Dual beam SEM Tescan

Ultra-high Resolution SEM Microscope Apreo 2 with EDS/WDS

Scanning probe microscopy (SPM)

Scanning tunneling microscopy (STM)

X-ray Photoelectron Spectroscopy (XPS)

X-ray Diffractometer (XRD)

Nanoindenter (Anton Paar)

Microtribometer Brucker UMT-2

Scratch-tester Brucker UMT-X

Calotest

Physical properties measurement system (PPMS)

Gas sensors measurement setup

Optical Profilmeter

Material modeling

S/W Quantum Espresso

S/W VASP