Advanced PVD magnetron sputtering systems (Cube)
Versatile PVD equipment enabling preparation of thin films using one 100 mm dia target or by co-sputtering of two 50 mm dia targets. The setup allows for DC/RF magnetron sputtering of one or two targets, one target can be operated operated in HiPIMS (High Power Impulse Magnetron Sputtering) mode with a synchronized bias. Both non-reactive (argon) and reactive gas (nitrogen) deposition is possible, with adjustable gas flow, sputtering power, bias and substrate tepmerature.
Specification
Stainless steel vacuum cube chamber
Two-stage pumping scroll pump
Edwards
Turbomolecular pump
Pfeiffer
Base pressure
< 5 x 10-4 Pa
Two mass flow controllers
mks Ar, N2
Full range vacuum gauge
Pirani + Penning, Pfeiffer
Unbalanced magnetron
- 100 mm in diameter
- with shutter
Two unbalanced magnetrons
- 50 mm in diameter each
- with shutters
DC power supply
EnterStream 5, 5 kW
RF power supply
ENI, 13.56 MHz
HiPIMS power supply
Ionautics HiPSTER 6, 6 kW
DC substrate bias / pulsed bias
- Ionautics HiPSTER 1
- with a synchronization unit (HiPSTER Sync Unit)
Oscilloscope
Substrate holder
for samples with size of up to 3 inches
Substrate heating
up to 450°C
