Annealing furnace up to 1300°C in high vacuum
High vacuum annealing of thin films is a thermal treatment process that involves heating a thin film (typically deposited onto a substrate) in a vacuum environment to modify its structural and physical properties. This process is performed under a vacuum level significantly lower than atmospheric pressure, often in the range of 10-5 to 10-3 Pa, to minimize the presence of gases or contaminants that could alter the film's characteristics.
Heating: Once the vacuum level is achieved, the film is gradually heated to a specific temperature, which depends on the material and the desired outcome. This temperature is typically below the melting point of the film material, but high enough to induce changes like grain growth, diffusion, stress relief, or phase transformation.
Cooling: After the annealing process, the film is slowly cooled down to room temperature to prevent thermal shock or cracking.
