Experimental PVD superlattice/multilayer sputtering system
PVD magnetron sputtering system for co-deposited and superlattice films. Three unbalanced magnetrons in 45° arrangement enable for in-situ adhesion layer deposition and co-deposition from two magnetrons at the same time. Automated magnetron shutters and rotatable sample holder enable deposition of multilayered films with sharp interfaces. Samples can be heated up to 600 °C and in-situ cleaned by Ar+ ions from Ar ion gun. Stable sputtering pressure during a reactive deposition can be controlled by PID regulation of reactive gas flow based on capacitive vacuum gauge signal.
Specification
Three unbalanced magnetrons with 100 mm targets
Magnetron power sources (Trumpf Hüttinger DC01 1kW, Advanced Energy MDX 10 kW)
High-voltage, pulsed DC bias
Ion gun for substrate cleaning (1600V, 100 mA)
DC-biased substrate holder (5x9 cm)
Rotatable (tilt) and heated substrate holder (up to 600 °C)
Two-stage vacuum system (Edwards E2S 45 rotary vane and Pfeiffer turbomolecular pumps)
Stainless steel octagon-shaped vacuum chamber (base pressure 1e-4 Pa)
Capacitive MKS Baratron and Pfeiffer full range vacuum gauges
Automated deposition process
Advantages over other magnetron equiped chambers
- Co-deposition from 3 independently controlled magnetrons
- Fabrication of superlattice structures (automated shutters)
- Rotatable sample holder (tilted deposition and chevron-like structures)
- In-situ substrate cleaning by Ar+ ions
