Ion etching chambers (Sputnik)

Vacuum system for dry etching. The system is evacuated by turbomolecular pump and scroll pump (base pressure <5x10-4Pa). The system uses hollow cathode ion source from PLATAR company. Various gases (Argon, Nitrogen) can be used to produce ions or neutrals which are subsequently accelerated onto the sample holder. Holder allows for rotation and cooling by means of Peltier element.