PVD chamber with Cluster Source
Lab-scale multi-purpose PVD sperical chamber with gas aggregation cluster source
Multi-purpose lab-scale PVD system based on the Kurt J. Lesker spherical vacuum chamber with 2 working flanges (upper ISO-F 150, bottom ISO-F 200) and large viewport (150mm in diameter) is equipped with Kurt J. Lesker TORUS 2" HV unbalanced magnetron sputtering source and rotatable specimen table with ceramic heater (deposition temperature up to 850C) and dark shield in basic configuration, and can be utilized for non-reactive and reactive sputtering of various small experimental targets.
The system allows upper-side and bottom-side mounting of magnetron sputtering source (for sputtering of brittle and cracked experimental targets). The system can be alternatively equipped with stationary specimen table with carbon fibre reinforced high-temperature heater and high-voltage bias, water-cooled specimen table with RF-bias, magnetron-based Haberland-type gas aggregation cluster source (GAS). GAS cluster source is utilized for production of nanoparticles of various size and shape, and consists of gas aggregation chamber, balanced magnetron sputtering source, and cone-shaped orifice separating the gas aggregation chamber from the main deposition chamber and maintaining the higher working pressure inside the gas aggregation chamber which is necessary for clustering and growth of nanoparticles.
Specification
Stainless steel Kurt J. Lesker spherical vacuum chamber
volume 51 l
Pumping scroll pump
Edwars nXDS 6i
Turbomolecular pump
Pfeiffer HiPace 300
Base pressure 10-3 - 10-4 Pa
depending on previously deposited material, exposition to air and pumping time
Mass flow controllers
Alicat 50 SCCM, 20 SCCM, multiple gases and gas mixtures
Full range vacuum gauge
Pirani+Penning, Pfeiffer
Unbalanced magnetron
Kurt J. Lesker TORUS 2" HV
Magnetron-based gas aggregation cluster sourse
with 3" balanced magnetron sputtering source
Rotatable specimen table
with ceramic heater 1-inch, up to 850C and darkshield
High-temperature biased substrate holder
for samples with size of up to 4 inches
Water-cooled RF-biased substrate holder
for samples with size of up to 3 inches
DC power supply
Kurt J. Lesker, 1 kW
RF power supply
Advanced Energy, 5 kW
