PVD magnetron sputtering systems
Two small versatile laboratory deposition chambers, each equipped with a single unbalanced magnetron. The systems allow for conventional and ionized magnetron sputtering (dcMS, rfMS, HiPIMS). They are equipped with biased and heated substrate holder and 3 mass flow controllers. In addition, an external magnetic field from Helmholtz coils can be applied to influence the plasma density in the substrate region and thus the properties of the deposited coatings [1, 2].
[1] K. Viskupová, Stoichiometry, structure and mechanical properties of TaB2±Δ coatings deposited by DC magnetron sputtering, Diploma Thesis, Comenius University, 2021
[2] K. Viskupová, B. Grančič, T. Roch, L. Satrapinskyy, M. Truchlý, M. Mikula, V. Šroba, P. Ďurina, P. Kúš, Surface & Coatings Technology 421 (2021) 127463
Specification
Stainless steel vacuum cylindrical chamber
Two-stage pumping scroll pump and turbomolecular pump
Pfeiffer
Base pressure
< 5 x 10-4 Pa
DC and RF power supply
13.56MHz
HiPIMS power supply with synchronsized bias
Ionautics HiPSTER
Mass flow controllers
MKS - Ar, O2, N2
Full range vacuum gauge
Pirani+Penning, Pfeiffer
Unbalanced magnetron
100 mm in diameter Kurt J. Lesker TORUS II
