Leonid Satrapinsky, Mgr., PhD.

The student will first get acquainted with the technical possibilities of achieving vacuum, its measurement and control of working gases. He will gain a comprehensive knowledge of physical methods of preparation of thin films (evaporation, sputtering, arc evaporation, pulsed laser deposition), where he will be explained in detail the physical aspects of the processes. The student will gain information about the growth of thin films, the influence of deposition parameters on the structure and properties of films. In the last part he will be introduced to the possibilities of creating functional structures in films using ion treatment and lithographic methods.

vacuum pumps, scales and flow controllers, Langmuir probe, mass spectroscopy, evaporation, DC and RF sputtering, magnetron, glow discharge, plasma parameters, high energy pulses (HiPPMS), pulsed laser deposition, laser optics, ablation mechanism, arc evaporation, cathode macroparticle filtering, thin film growth, surface energy, thermodynamic nucleation model, zonal models, texture, epitaxy, focused ion beam, nanotubes, electron lithography, optical lithography

By completing the course, students will gain an overview of selected analytical, spectroscopic and microscopic methods used for studies of solids in terms their structure, composition, surface topography and other properties.